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Proceedings Paper

Color centers photomasks produced by electron-beam lithography
Author(s): Raul Almeida Nunes; Sidnei Paciornik; Luiz C. Scavarda do Carmo
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Paper Details

Date Published: 1 June 1992
PDF: 7 pages
Proc. SPIE 1674, Optical/Laser Microlithography V, (1 June 1992); doi: 10.1117/12.130351
Show Author Affiliations
Raul Almeida Nunes, Pontifical Catholic Univ. of Rio de Janeiro (Brazil)
Sidnei Paciornik, Pontifical Catholic Univ. of Rio de Janeiro (Brazil)
Luiz C. Scavarda do Carmo, Pontifical Catholic Univ. of Rio de Janeiro (Brazil)


Published in SPIE Proceedings Vol. 1674:
Optical/Laser Microlithography V
John D. Cuthbert, Editor(s)

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