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Proceedings Paper

Practicing the top antireflector process
Author(s): Christopher F. Lyons; Robert K. Leidy; Gary B. Smith
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Paper Details

Date Published: 1 June 1992
PDF: 9 pages
Proc. SPIE 1674, Optical/Laser Microlithography V, (1 June 1992); doi: 10.1117/12.130348
Show Author Affiliations
Christopher F. Lyons, IBM/Advanced Technology Ctr. (United States)
Robert K. Leidy, IBM/General Technology Div. (United States)
Gary B. Smith, Hoechst Celanese Corp. (United States)

Published in SPIE Proceedings Vol. 1674:
Optical/Laser Microlithography V
John D. Cuthbert, Editor(s)

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