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Proceedings Paper

Lithographic impact of thin film effects on advanced BIMOS semiconductor device layer structures
Author(s): Fourmun Lee; Sandeep Malhotra; Victor Louis; John N. Helbert
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Paper Details

Date Published: 1 June 1992
PDF: 6 pages
Proc. SPIE 1674, Optical/Laser Microlithography V, (1 June 1992); doi: 10.1117/12.130347
Show Author Affiliations
Fourmun Lee, Motorola, Inc. (United States)
Sandeep Malhotra, Motorola, Inc. (United States)
Victor Louis, Motorola, Inc. (United States)
John N. Helbert, Motorola, Inc. (United States)

Published in SPIE Proceedings Vol. 1674:
Optical/Laser Microlithography V
John D. Cuthbert, Editor(s)

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