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Proceedings Paper

Alignment technique using wafer rear surface
Author(s): Souichi Katagiri; Shigeo Moriyama; Tsuneo Terasawa
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Paper Details

Date Published: 1 June 1992
PDF: 8 pages
Proc. SPIE 1674, Optical/Laser Microlithography V, (1 June 1992); doi: 10.1117/12.130346
Show Author Affiliations
Souichi Katagiri, Hitachi Central Research Lab. (Japan)
Shigeo Moriyama, Hitachi Central Research Lab. (Japan)
Tsuneo Terasawa, Hitachi Central Research Lab. (Japan)

Published in SPIE Proceedings Vol. 1674:
Optical/Laser Microlithography V
John D. Cuthbert, Editor(s)

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