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Proceedings Paper

Advanced krypton fluoride excimer laser for microlithography
Author(s): Toshihiko Ishihara; Richard L. Sandstrom; Christopher Reiser; Uday K. Sengupta
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Paper Abstract

In this paper, we present performance, reliability, and maintainability data for the ELS-4000, a production-worthy, spectrally narrowed KrF excimer laser for wafer steppers. This laser uses the same modular design concept as its predecessor, the CX-2LS. The ELS-4000 exhibits the following specifications: (i) spectral bandwidth (FWHM) less than 2.0 pm; (ii) wavelength stability less than or equal to 0.25 pm; (iii) output power of 4 W at 400 Hz; (iv) pulse-to-pulse energy stability less than or equal to 2.5%; (v) fast and accurate wavelength slewing and locking capability; (vi) small footprint measuring 0.74 m by 1.36 m; (vii) mean productive time between failures exceeding 700 hours; and (viii) design and engineering features, which meet all the safety standards of the semiconductor industry.

Paper Details

Date Published: 1 June 1992
PDF: 13 pages
Proc. SPIE 1674, Optical/Laser Microlithography V, (1 June 1992); doi: 10.1117/12.130343
Show Author Affiliations
Toshihiko Ishihara, Cymer Laser Technologies (United States)
Richard L. Sandstrom, Cymer Laser Technologies (United States)
Christopher Reiser, Cymer Laser Technologies (United States)
Uday K. Sengupta, Cymer Laser Technologies (United States)


Published in SPIE Proceedings Vol. 1674:
Optical/Laser Microlithography V
John D. Cuthbert, Editor(s)

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