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Proceedings Paper

Trend and limitation of process using the simulation and experimental method for phase-shift mask
Author(s): Young-Mog Ham; YoungSik Kim; H. K. Oh; Dong-Jun Ahn; K. S. Oh
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Paper Details

Date Published: 1 June 1992
PDF: 11 pages
Proc. SPIE 1674, Optical/Laser Microlithography V, (1 June 1992); doi: 10.1117/12.130342
Show Author Affiliations
Young-Mog Ham, Hyundai Electronics Industries Co., Ltd. (South Korea)
YoungSik Kim, Hyundai Electronics Industries Co., Ltd. (South Korea)
H. K. Oh, Hyundai Electronics Industries Co., Ltd. (South Korea)
Dong-Jun Ahn, Hyundai Electronics Industries Co., Ltd. (South Korea)
K. S. Oh, Hyundai Electronics Industries Co., Ltd. (South Korea)


Published in SPIE Proceedings Vol. 1674:
Optical/Laser Microlithography V
John D. Cuthbert, Editor(s)

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