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Proceedings Paper

Characterization of mask fabrication for submicron geometries using a shaped vector electron-beam system
Author(s): Warren W. Flack; David H. Dameron; Richard A. Mann; Valerie J. Alameda
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Paper Details

Date Published: 1 June 1992
PDF: 12 pages
Proc. SPIE 1674, Optical/Laser Microlithography V, (1 June 1992); doi: 10.1117/12.130341
Show Author Affiliations
Warren W. Flack, TRW, Inc. (United States)
David H. Dameron, TRW, Inc. (United States)
Richard A. Mann, TRW, Inc. (United States)
Valerie J. Alameda, TRW, Inc. (United States)


Published in SPIE Proceedings Vol. 1674:
Optical/Laser Microlithography V
John D. Cuthbert, Editor(s)

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