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Proceedings Paper

New method of topography simulation in photolithography
Author(s): Joerg Bischoff; Ulrich Glaubitz; Norbert Haase
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Paper Details

Date Published: 1 June 1992
PDF: 12 pages
Proc. SPIE 1674, Optical/Laser Microlithography V, (1 June 1992); doi: 10.1117/12.130339
Show Author Affiliations
Joerg Bischoff, Ilmenau Institute of Technology (United States)
Ulrich Glaubitz, OEG (Germany)
Norbert Haase, MTG (Germany)

Published in SPIE Proceedings Vol. 1674:
Optical/Laser Microlithography V
John D. Cuthbert, Editor(s)

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