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Proceedings Paper

Chromeless phase mask by resist silylation
Author(s): Lothar Bauch; Joachim J. Bauer; Helge H. Dreger; Ulrich A. Jagdhold; B. Lauche; Georg G. Mehliss
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Paper Details

Date Published: 1 June 1992
PDF: 11 pages
Proc. SPIE 1674, Optical/Laser Microlithography V, (1 June 1992); doi: 10.1117/12.130338
Show Author Affiliations
Lothar Bauch, Institut fuer Halbleiterphysik (Germany)
Joachim J. Bauer, Institut fuer Halbleiterphysik (Germany)
Helge H. Dreger, Institut fuer Halbleiterphysik (Germany)
Ulrich A. Jagdhold, Institut fuer Halbleiterphysik (Germany)
B. Lauche, Zentrum fuer Mikroelektronik Dresden (Germany)
Georg G. Mehliss, Fotochemische Werke GmbH (Germany)

Published in SPIE Proceedings Vol. 1674:
Optical/Laser Microlithography V
John D. Cuthbert, Editor(s)

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