Share Email Print
cover

Proceedings Paper

Chromeless phase mask by resist silylation
Author(s): Lothar Bauch; Joachim J. Bauer; Helge H. Dreger; Ulrich A. Jagdhold; B. Lauche; Georg G. Mehliss
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Details

Date Published: 1 June 1992
PDF: 11 pages
Proc. SPIE 1674, Optical/Laser Microlithography V, (1 June 1992); doi: 10.1117/12.130338
Show Author Affiliations
Lothar Bauch, Institut fuer Halbleiterphysik (Germany)
Joachim J. Bauer, Institut fuer Halbleiterphysik (Germany)
Helge H. Dreger, Institut fuer Halbleiterphysik (Germany)
Ulrich A. Jagdhold, Institut fuer Halbleiterphysik (Germany)
B. Lauche, Zentrum fuer Mikroelektronik Dresden (Germany)
Georg G. Mehliss, Fotochemische Werke GmbH (Germany)


Published in SPIE Proceedings Vol. 1674:
Optical/Laser Microlithography V
John D. Cuthbert, Editor(s)

© SPIE. Terms of Use
Back to Top