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Proceedings Paper

Modeling spray/puddle dissolution processes for DUV acid-hardened resists
Author(s): John M. Hutchinson; Siddhartha Das; Qi-De Qian; Henry T. Gaw
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Paper Details

Date Published: 1 June 1992
PDF: 12 pages
Proc. SPIE 1674, Optical/Laser Microlithography V, (1 June 1992); doi: 10.1117/12.130337
Show Author Affiliations
John M. Hutchinson, Intel Corp. (United States)
Siddhartha Das, Intel Corp. (United States)
Qi-De Qian, Intel Corp. (United States)
Henry T. Gaw, Intel Corp. (United States)

Published in SPIE Proceedings Vol. 1674:
Optical/Laser Microlithography V
John D. Cuthbert, Editor(s)

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