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Proceedings Paper

Novel ARC optimization methodology for KrF excimer laser lithography at low K1 factor
Author(s): Tohru Ogawa; Mitsumori Kimura; Yoichi Tomo; Toshiro Tsumori
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Paper Details

Date Published: 1 June 1992
PDF: 14 pages
Proc. SPIE 1674, Optical/Laser Microlithography V, (1 June 1992); doi: 10.1117/12.130335
Show Author Affiliations
Tohru Ogawa, Sony Corp. (Japan)
Mitsumori Kimura, Sony Corp. (Japan)
Yoichi Tomo, Sony Corp. (Japan)
Toshiro Tsumori, Sony Corp. (Japan)

Published in SPIE Proceedings Vol. 1674:
Optical/Laser Microlithography V
John D. Cuthbert, Editor(s)

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