Share Email Print
cover

Proceedings Paper

Novel ARC optimization methodology for KrF excimer laser lithography at low K1 factor
Author(s): Tohru Ogawa; Mitsumori Kimura; Yoichi Tomo; Toshiro Tsumori
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Details

Date Published: 1 June 1992
PDF: 14 pages
Proc. SPIE 1674, Optical/Laser Microlithography V, (1 June 1992); doi: 10.1117/12.130335
Show Author Affiliations
Tohru Ogawa, Sony Corp. (Japan)
Mitsumori Kimura, Sony Corp. (Japan)
Yoichi Tomo, Sony Corp. (Japan)
Toshiro Tsumori, Sony Corp. (Japan)


Published in SPIE Proceedings Vol. 1674:
Optical/Laser Microlithography V
John D. Cuthbert, Editor(s)

© SPIE. Terms of Use
Back to Top