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Proceedings Paper

New antireflective layer for deep-UV lithography
Author(s): Yurika Suda; Takushi Motoyama; Hideki Harada; Masao Kanazawa
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Paper Details

Date Published: 1 June 1992
PDF: 12 pages
Proc. SPIE 1674, Optical/Laser Microlithography V, (1 June 1992); doi: 10.1117/12.130334
Show Author Affiliations
Yurika Suda, Fujitsu Ltd. (Japan)
Takushi Motoyama, Fujitsu Ltd. (Japan)
Hideki Harada, Fujitsu Ltd. (Japan)
Masao Kanazawa, Fujitsu Ltd. (Japan)


Published in SPIE Proceedings Vol. 1674:
Optical/Laser Microlithography V
John D. Cuthbert, Editor(s)

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