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Proceedings Paper

Strategies for deep-UV patterning of half-micron contacts using negative photoresists
Author(s): Susan K. Jones; Elliott Sean Capsuto; Bruce W. Dudley; Satyendra S. Sethi; Charles R. Peters
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Paper Details

Date Published: 1 June 1992
PDF: 9 pages
Proc. SPIE 1674, Optical/Laser Microlithography V, (1 June 1992); doi: 10.1117/12.130333
Show Author Affiliations
Susan K. Jones, Microelectronics Ctr. of North Carolina (United States)
Elliott Sean Capsuto, SEMATECH (United States)
Bruce W. Dudley, Microelectronics Ctr. of North Carolina (United States)
Satyendra S. Sethi, SEMATECH (United States)
Charles R. Peters, Microelectronics Ctr. of North Carolina (United States)


Published in SPIE Proceedings Vol. 1674:
Optical/Laser Microlithography V
John D. Cuthbert, Editor(s)

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