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Proceedings Paper

Effect of chromatic aberration in excimer laser lithography
Author(s): Pei-yang Yan; Qi-De Qian; Joseph C. Langston; Paco Leon
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Paper Details

Date Published: 1 June 1992
PDF: 12 pages
Proc. SPIE 1674, Optical/Laser Microlithography V, (1 June 1992); doi: 10.1117/12.130330
Show Author Affiliations
Pei-yang Yan, Intel Corp. (United States)
Qi-De Qian, Intel Corp. (United States)
Joseph C. Langston, Intel Corp. (United States)
Paco Leon, Intel Corp. (United States)

Published in SPIE Proceedings Vol. 1674:
Optical/Laser Microlithography V
John D. Cuthbert, Editor(s)

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