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Proceedings Paper

Efficient numerical simulation of high-NA i-line lithography processes
Author(s): Chi-Min Yuan; Steve S. Miura; Nicholas K. Eib
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Paper Details

Date Published: 1 June 1992
PDF: 19 pages
Proc. SPIE 1674, Optical/Laser Microlithography V, (1 June 1992); doi: 10.1117/12.130329
Show Author Affiliations
Chi-Min Yuan, IBM/East Fishkill Facility (United States)
Steve S. Miura, IBM/East Fishkill Facility (United States)
Nicholas K. Eib, IBM/East Fishkill Facility (United States)

Published in SPIE Proceedings Vol. 1674:
Optical/Laser Microlithography V
John D. Cuthbert, Editor(s)

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