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Proceedings Paper

Understanding focus effects in submicron optical lithography: Part 3--methods for depth-of-focus improvement
Author(s): Chris A. Mack
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Paper Details

Date Published: 1 June 1992
PDF: 13 pages
Proc. SPIE 1674, Optical/Laser Microlithography V, (1 June 1992); doi: 10.1117/12.130327
Show Author Affiliations
Chris A. Mack, FINLE Technologies (United States)


Published in SPIE Proceedings Vol. 1674:
Optical/Laser Microlithography V
John D. Cuthbert, Editor(s)

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