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Proceedings Paper

Optimization of positive novolak-based resists for phase-shift mask technology
Author(s): Peggy M. Spragg; Giang T. Dao; Steven G. Hansen; Robert F. Leonard; Medhat A. Toukhy; Rajeev R. Singh; Kenny K.H. Toh
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Paper Details

Date Published: 1 June 1992
PDF: 12 pages
Proc. SPIE 1674, Optical/Laser Microlithography V, (1 June 1992); doi: 10.1117/12.130325
Show Author Affiliations
Peggy M. Spragg, OCG Microelectronic Materials, Inc. (United States)
Giang T. Dao, Intel Corp. (United States)
Steven G. Hansen, OCG Microelectronic Materials, Inc. (United States)
Robert F. Leonard, OCG Microelectronic Materials, Inc. (United States)
Medhat A. Toukhy, OCG Microelectronic Materials, Inc. (United States)
Rajeev R. Singh, Intel Corp. (United States)
Kenny K.H. Toh, Intel Corp. (United States)


Published in SPIE Proceedings Vol. 1674:
Optical/Laser Microlithography V
John D. Cuthbert, Editor(s)

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