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Proceedings Paper

Fabrication and evaluation of chromium/phase-shifter/quartz structure phase-shift mask
Author(s): Tadao Yasuzato; Haruo Iwasaki; Hiroshi Nozue; Kunihiko Kasama
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Paper Abstract

The deviation of phase shift angle from 180° seriously deteriorates the focus latitude. In order to obtain the expected performance of phase shift mask, a Chromium(Cr)/Phase-Shifter/Quartz(Qz) structure is investigated. In this phase shift mask structure, the shifter thickness i.e., phase shift angle, can be precisely controlled, compared with a conventional Shifter/Cr/Qz structure. Spin-on-grass(SOG) is used as the phase shifter material because of its excellent thickness uniformity. Alternating phase shift mask that has the Cr/SOG/Qz structure was fabricated using Ar-laser writing method, and evaluated using a NA=0.45, 6=0.3-0.5,I-line stepper. Obtained results show that this phase shift mask structure is very promising for the subhalfmicron pattern formation.

Paper Details

Date Published: 1 June 1992
PDF: 11 pages
Proc. SPIE 1674, Optical/Laser Microlithography V, (1 June 1992); doi: 10.1117/12.130324
Show Author Affiliations
Tadao Yasuzato, NEC Corp. (Japan)
Haruo Iwasaki, NEC Corp. (Japan)
Hiroshi Nozue, NEC Corp. (Japan)
Kunihiko Kasama, NEC Corp. (Japan)


Published in SPIE Proceedings Vol. 1674:
Optical/Laser Microlithography V
John D. Cuthbert, Editor(s)

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