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Proceedings Paper

Improving stepper alignment capability through phase-shifting techniques
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Paper Details

Date Published: 1 June 1992
PDF: 13 pages
Proc. SPIE 1674, Optical/Laser Microlithography V, (1 June 1992); doi: 10.1117/12.130321
Show Author Affiliations
Mircea V. Dusa, SEEQ Technology, Inc. (United States)
Maciej W. Rudzinski, Nikon Precision, Inc. (United States)

Published in SPIE Proceedings Vol. 1674:
Optical/Laser Microlithography V
John D. Cuthbert, Editor(s)

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