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Proceedings Paper

Process solutions for the global proximity effect on submicron lithography
Author(s): Daniel Hao-Tien Lee; Ronfu Chu
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Paper Details

Date Published: 1 June 1992
PDF: 15 pages
Proc. SPIE 1674, Optical/Laser Microlithography V, (1 June 1992); doi: 10.1117/12.130318
Show Author Affiliations
Daniel Hao-Tien Lee, Industrial Technology Research Institute (Taiwan)
Ronfu Chu, ASM Lithography, Inc. (Taiwan)

Published in SPIE Proceedings Vol. 1674:
Optical/Laser Microlithography V
John D. Cuthbert, Editor(s)

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