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Proceedings Paper

New process technology for CD control in deep-submicron optical lithography
Author(s): Aritoshi Sugimoto; Osamu Suga; Kazuyuki Suko; Hitoshi Arakawa
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Paper Details

Date Published: 1 June 1992
PDF: 8 pages
Proc. SPIE 1674, Optical/Laser Microlithography V, (1 June 1992); doi: 10.1117/12.130317
Show Author Affiliations
Aritoshi Sugimoto, Hitachi, Ltd. (Japan)
Osamu Suga, Hitachi, Ltd. (Japan)
Kazuyuki Suko, Hitachi, Ltd. (Japan)
Hitoshi Arakawa, Hitachi, Ltd. (Japan)


Published in SPIE Proceedings Vol. 1674:
Optical/Laser Microlithography V
John D. Cuthbert, Editor(s)

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