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Proceedings Paper

Reduction of linewidth variation over reflective topography
Author(s): Steve S. Miura; Christopher F. Lyons; Timothy A. Brunner
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Paper Details

Date Published: 1 June 1992
PDF: 10 pages
Proc. SPIE 1674, Optical/Laser Microlithography V, (1 June 1992); doi: 10.1117/12.130316
Show Author Affiliations
Steve S. Miura, IBM/East Fishkill Facility (United States)
Christopher F. Lyons, IBM/East Fishkill Facility (United States)
Timothy A. Brunner, IBM/Thomas J. Watson Research Ctr. (United States)

Published in SPIE Proceedings Vol. 1674:
Optical/Laser Microlithography V
John D. Cuthbert, Editor(s)

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