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Proceedings Paper

Characterization and performance of advanced i-line photoresists for 0.5-micron CMOS technology
Author(s): Jeffrey R. Johnson; Gregory J. Stagaman; John C. Sardella; Charles R. Spinner; Fu-Tai Liou
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Paper Abstract

An evaluation procedure for advanced I-line photoresists is presented. The evaluation is comprehensive in nature, including manufacturing and quality requirements as well as the usual patterning performance tests. The evaluation is divided into three general categories: Performance, Manufacturability, and Materials. These categories include a total of 23 individual performance tests and 15 evaluation criteria. A scoring method is described which assigns a numerical rating to the resist performance. Weighting constants contained in this procedure can be adjusted to vary the emphasis on particular measures of the photoresist performance.

Paper Details

Date Published: 1 June 1992
PDF: 7 pages
Proc. SPIE 1674, Optical/Laser Microlithography V, (1 June 1992); doi: 10.1117/12.130315
Show Author Affiliations
Jeffrey R. Johnson, SGS-Thomson Microelectronics, Inc. (United States)
Gregory J. Stagaman, SGS-Thomson Microelectronics, Inc. (United States)
John C. Sardella, SGS-Thomson Microelectronics, Inc. (United States)
Charles R. Spinner, SGS-Thomson Microelectronics, Inc. (United States)
Fu-Tai Liou, SGS-Thomson Microelectronics, Inc. (United States)


Published in SPIE Proceedings Vol. 1674:
Optical/Laser Microlithography V
John D. Cuthbert, Editor(s)

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