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Proceedings Paper

Characterization and performance of advanced i-line photoresists for 0.5-micron CMOS technology
Author(s): Jeffrey R. Johnson; Gregory J. Stagaman; John C. Sardella; Charles R. Spinner; Fu-Tai Liou
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Paper Details

Date Published: 1 June 1992
PDF: 7 pages
Proc. SPIE 1674, Optical/Laser Microlithography V, (1 June 1992); doi: 10.1117/12.130315
Show Author Affiliations
Jeffrey R. Johnson, SGS-Thomson Microelectronics, Inc. (United States)
Gregory J. Stagaman, SGS-Thomson Microelectronics, Inc. (United States)
John C. Sardella, SGS-Thomson Microelectronics, Inc. (United States)
Charles R. Spinner, SGS-Thomson Microelectronics, Inc. (United States)
Fu-Tai Liou, SGS-Thomson Microelectronics, Inc. (United States)


Published in SPIE Proceedings Vol. 1674:
Optical/Laser Microlithography V
John D. Cuthbert, Editor(s)

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