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Proceedings Paper

Advanced i-line resist performance with and without phase-shift masks
Author(s): Nicholas K. Eib; Eytan Barouch; Uwe Hollerbach; Steven A. Orszag
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Paper Details

Date Published: 1 June 1992
PDF: 24 pages
Proc. SPIE 1674, Optical/Laser Microlithography V, (1 June 1992); doi: 10.1117/12.130313
Show Author Affiliations
Nicholas K. Eib, IBM/East Fishkill Facility (United States)
Eytan Barouch, Princeton Univ. (United States)
Uwe Hollerbach, Princeton Univ. (United States)
Steven A. Orszag, Princeton Univ. (United States)


Published in SPIE Proceedings Vol. 1674:
Optical/Laser Microlithography V
John D. Cuthbert, Editor(s)

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