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Proceedings Paper

Subhalf-micron lithography system with phase-shifting effect
Author(s): Miyoko Noguchi; Masato Muraki; Yuichi Iwasaki; Akiyoshi Suzuki
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Paper Details

Date Published: 1 June 1992
PDF: 13 pages
Proc. SPIE 1674, Optical/Laser Microlithography V, (1 June 1992); doi: 10.1117/12.130312
Show Author Affiliations
Miyoko Noguchi, Canon Inc. (Japan)
Masato Muraki, Canon Inc. (Japan)
Yuichi Iwasaki, Canon Inc. (Japan)
Akiyoshi Suzuki, Canon Inc. (Japan)

Published in SPIE Proceedings Vol. 1674:
Optical/Laser Microlithography V
John D. Cuthbert, Editor(s)

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