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Proceedings Paper

Exploring the limits of phase-shift lithography: Part I--the alternating shifter
Author(s): Shane R. Palmer; Cesar M. Garza; Craig B. Sager; Patrick Reynolds
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Paper Details

Date Published: 1 June 1992
PDF: 16 pages
Proc. SPIE 1674, Optical/Laser Microlithography V, (1 June 1992); doi: 10.1117/12.130311
Show Author Affiliations
Shane R. Palmer, Texas Instruments Inc. (United States)
Cesar M. Garza, Texas Instruments Inc. (United States)
Craig B. Sager, Benchmark Technologies, Inc. (United States)
Patrick Reynolds, Benchmark Technologies, Inc. (United States)

Published in SPIE Proceedings Vol. 1674:
Optical/Laser Microlithography V
John D. Cuthbert, Editor(s)

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