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Proceedings Paper

Systematic design of phase-shifting masks with extended depth of focus and/or shifted focus plane
Author(s): Yong Liu; Anton K. Pfau; Avideh Zakhor
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Paper Details

Date Published: 1 June 1992
PDF: 39 pages
Proc. SPIE 1674, Optical/Laser Microlithography V, (1 June 1992); doi: 10.1117/12.130308
Show Author Affiliations
Yong Liu, Univ. of California/Berkeley (United States)
Anton K. Pfau, Univ. of California/Berkeley (United States)
Avideh Zakhor, Univ. of California/Berkeley (United States)

Published in SPIE Proceedings Vol. 1674:
Optical/Laser Microlithography V
John D. Cuthbert, Editor(s)

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