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Proceedings Paper

Three-dimensional inspection of integrated circuits: a depth from focus approach
Author(s): Xavier Binefa; Jordi M. Vitria; Juan Jose Villanueva
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Paper Abstract

Optical inspection of integrated circuit images is an application of image understanding which is becoming an important field in the microelectronics industry. When the inspection is performed by optical microscopy, a small depth of field of an optical system causes problems dealing with focusing when structures with large depth variations are imaged. We propose a method which takes advantage of this effect to make a depth map of the circuit surface. The method is based on the analysis of defocusing on a series of images obtained by continuously varying the distance between the circuit surface and the center of the optical system. Morphological algorithms working in three-dimensional spaces are used to ensure the coherence of the results.

Paper Details

Date Published: 1 August 1992
PDF: 7 pages
Proc. SPIE 1661, Machine Vision Applications in Character Recognition and Industrial Inspection, (1 August 1992); doi: 10.1117/12.130302
Show Author Affiliations
Xavier Binefa, Univ. Autonoma de Barcelona (Spain)
Jordi M. Vitria, Univ. Autonoma de Barcelona (Spain)
Juan Jose Villanueva, Univ. Autonoma de Barcelona (Spain)


Published in SPIE Proceedings Vol. 1661:
Machine Vision Applications in Character Recognition and Industrial Inspection
Donald P. D'Amato; Wolf-Ekkehard Blanz; Byron E. Dom; Sargur N. Srihari, Editor(s)

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