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Optical Engineering

Holograms For Optical Interconnects For Very Large Scale Integrated Circuits Fabricated By Electron-Beam Lithography
Author(s): Michael R. Feldman; Clark C. Guest
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Paper Details

Date Published: 1 August 1989
PDF: 7 pages
Opt. Eng. 28(8) doi: 10.1117/12.7977056
Published in: Optical Engineering Volume 28, Issue 8
Show Author Affiliations
Michael R. Feldman, University of North Carolina at Charlotte (United States)
Clark C. Guest, University of California, San Diego (United States)


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