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Optical Engineering

Optical-Diffraction-Based Modulation Of Photoresist Profile For Microlithography Applications
Author(s): Marco I. Buraschi; Laura Bacci; Giorgio De Santi
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Paper Abstract

A novel method for obtaining a tapered profile in photoresist is proposed. On the mask near the main features we add some slits smaller than the resolution limit of the projection optics at a distance also smaller than the resolution limit. In such a way, a controlled sloped profile can be obtained. We have applied this method to open tapered contacts and vias (contacts between two levels of metal) without using the thermal reflow technique of borophos-phosilicate glass, optimizing the configuration of the subresolved slits by means of a simplified mathematical model. There is experimental evidence that contacts can still be opened up to the diffraction limit of the projection optics.

Paper Details

Date Published: 1 June 1989
PDF: 5 pages
Opt. Eng. 28(6) doi: 10.1117/12.7977016
Published in: Optical Engineering Volume 28, Issue 6
Show Author Affiliations
Marco I. Buraschi, SGS-Thomson Microelectronics (Italy)
Laura Bacci, SGS-Thomson Microelectronics (Italy)
Giorgio De Santi, SGS-Thomson Microelectronics (Italy)


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