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Optical Engineering

Optical-Diffraction-Based Modulation Of Photoresist Profile For Microlithography Applications
Author(s): Marco I. Buraschi; Laura Bacci; Giorgio De Santi
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Paper Details

Date Published: 1 June 1989
PDF: 5 pages
Opt. Eng. 28(6) doi: 10.1117/12.7977016
Published in: Optical Engineering Volume 28, Issue 6
Show Author Affiliations
Marco I. Buraschi, SGS-Thomson Microelectronics (Italy)
Laura Bacci, SGS-Thomson Microelectronics (Italy)
Giorgio De Santi, SGS-Thomson Microelectronics (Italy)


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