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Optical Engineering

Capacitive Focusing Method For Microlithography
Author(s): Meir Nitzan; Jack Broder; Naftali Eisenberg; Leo Levi
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Paper Abstract

Focusing is a critical requirement in optical microlithography. The high resolution required calls for a large relative aperture, and this in turn shortens the depth of focus. Depth of focus on the order of the wavelength of light is a major technical problem, especially if one does not impose narrow tolerances on the flatness of the substrate. Here we report on a capacitive focusing method that makes feasible focusing accuracies to a fraction of a micrometer, automatically if desired. The theory, an implementation, and results obtained are presented.

Paper Details

Date Published: 1 July 1988
PDF: 3 pages
Opt. Eng. 27(7) doi: 10.1117/12.7976715
Published in: Optical Engineering Volume 27, Issue 7
Show Author Affiliations
Meir Nitzan, Jerusalem College of Technology (Israel)
Jack Broder, Jerusalem College of Technology (Israel)
Naftali Eisenberg, Jerusalem College of Technology (Israel)
Leo Levi, Jerusalem College of Technology (Israel)

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