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Optical Engineering

Resist Technology For Submicrometer Optical Lithography
Author(s): W. R. Brunsvold; D. M. Crockatt; G. J. Hefferon; C. F. Lyons
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Paper Details

Date Published: 1 April 1987
PDF: 7 pages
Opt. Eng. 26(4) doi: 10.1117/12.7974075
Published in: Optical Engineering Volume 26, Issue 4
Show Author Affiliations
W. R. Brunsvold, IBM East Fishkill (United States)
D. M. Crockatt, IBM East Fishkill (United States)
G. J. Hefferon, IBM East Fishkill (United States)
C. F. Lyons, IBM East Fishkill (United States)


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