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Optical Engineering

Excimer Laser Based Lithography: A Deep-Ultraviolet Wafer Stepper For VLSI Processing
Author(s): Victor Pol; James H. Bennewitz; Tanya E. Jewell; Darryl W. Peters
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Paper Details

Date Published: 1 April 1987
PDF: 8 pages
Opt. Eng. 26(4) doi: 10.1117/12.7974072
Published in: Optical Engineering Volume 26, Issue 4
Show Author Affiliations
Victor Pol, AT&T Bell Laboratories (United States)
James H. Bennewitz, AT&T Bell Laboratories (United States)
Tanya E. Jewell, AT&T Bell Laboratories (United States)
Darryl W. Peters, AT&T Bell Laboratories (United States)


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