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Optical Engineering

Holographic Optical Processing For Submicrometer Defect Detection
Author(s): R. L. Fusek; L. H. Lin; K. Harding; S. Gustafson
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Paper Abstract

A holographic optical processor has been built for efficient, fast, wide-field detection of submicrometer defects in repetitive subject formats such as integrated circuit photomasks. This paper describes the advantages gained by combining holography with standard optical processing techniques and presents results obtained on a 2 in. field-of-view prototype and 7 in. field-of-view fully automated mask inspection system.

Paper Details

Date Published: 1 August 1985
PDF: 4 pages
Opt. Eng. 24(5) 245731 doi: 10.1117/12.7973567
Published in: Optical Engineering Volume 24, Issue 5
Show Author Affiliations
R. L. Fusek, Insystems, Incorporated (United States)
L. H. Lin, Insystems, Incorporated (United States)
K. Harding, Industrial Technology Institute (United States)
S. Gustafson, University of Dayton Research Institute (United States)

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