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Optical Engineering

Guided Wave Optical Structures Utilizing Silicon
Author(s): J. T. Boyd; R. W. Wu; D. E. Zelmon; A. Naumaan; H. A. Timlin; Howard E. Jackson
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Paper Abstract

Planar and channel optical waveguide structures formed on silicon substrates using the fabrication techniques of sputtering, thermal oxidation, and chemical vapor deposition are discussed. Losses in the various waveguide structures are reported and related to the fabrication procedure used. The use of polycrystalline silicon deposited by chemical vapor deposition onto any waveguide substrate to form integrated photodetector arrays is discussed. Laser recrystallization of the deposited silicon is used to allow fabrication of high quality devices. Measured values of photodiode reverse current of less than 10-9 A and breakdown voltages of 24 V are respectable values for small photodiodes incorporated into a dense array.

Paper Details

Date Published: 1 April 1985
PDF: 5 pages
Opt. Eng. 24(2) doi: 10.1117/12.7973460
Published in: Optical Engineering Volume 24, Issue 2
Show Author Affiliations
J. T. Boyd, University of Cincinnati (United States)
R. W. Wu, University of Cincinnati (United States)
D. E. Zelmon, University of Cincinnati (United States)
A. Naumaan, University of Cincinnati (United States)
H. A. Timlin, University of Cincinnati (United States)
Howard E. Jackson, University of Cincinnati (United States)


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