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Optical Engineering

Photonics For Integrated Circuits And Communications
Author(s): J. L. Merz; Y. R. Yuan; G. A. Vawter
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Paper Abstract

This paper reviews recent progress in the development of integrated optical circuits involving the GaAs/AfGaAs double heterostructure system. Devices utilizing periodic corrugations or gratings are considered briefly, whereas alternative attempts to fabricate optical circuits by chemical etching are discussed in detail. The InGaAsP/InP system is also considered. Recent advances in processing techniques for optical integration, including reactive ion etching, are described, along with recent measurements that correlate waveguide loss with epitaxial layer uniformity.

Paper Details

Date Published: 1 April 1985
PDF: 6 pages
Opt. Eng. 24(2) 242214 doi: 10.1117/12.7973457
Published in: Optical Engineering Volume 24, Issue 2
Show Author Affiliations
J. L. Merz, University of California (United States)
Y. R. Yuan, University of California (United States)
G. A. Vawter, University of California (United States)

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