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Optical Engineering

Laser Chemical Vapor Deposition Using Continuous Wave And Pulsed Lasers
Author(s): S. D. Allen; A. B. Trigubo; Y. C. Liu
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Paper Abstract

The deposition rate in laser chemical vapor deposition (LCVD) is a function of the surface temperature and therefore also a function of the chang-ing reflectivity of the surface during deposition. The influence of these parame-ters on the LCVD rate of metallic and insulating thin films was investigated using both pulsed and cw laser sources and optical monitoring of the depositing film thickness. Physical properties of the LCVD films are reported.

Paper Details

Date Published: 1 August 1984
PDF: 5 pages
Opt. Eng. 23(4) 234470 doi: 10.1117/12.7973320
Published in: Optical Engineering Volume 23, Issue 4
Show Author Affiliations
S. D. Allen, University of Southern California (United States)
A. B. Trigubo, University of Southern California (United States)
Y. C. Liu, University of Southern California (United States)


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