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Optical Engineering

Ion Beam Sputter Deposition Of Optical Coatings
Author(s): J. R. Sites; P. Gilstrap; R. Rujkorakarn
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Paper Abstract

A beam of 500 to 1200 eV argon and oxygen ions, neutralized with an equal number of electrons, strikes a target, and the sputtered particles form a deposited layer of SiO2, Ta205, or TiO2. A second beam at lower energy is aimed at the substrate and used for stress modification and predeposition sputter cleaning. Deposited films are mechanically stable and extremely adherent; internal stress is compressive. The primary contaminant is carbon, which is less than one percent. Refractive indices near 1 µm are 1.47 for SiO2, 2.03 for Ta205, and 2.27 for Ti02. Optical absorptance of half-wavelength films at 1.06 Am is near 10-4 for SiO2 and Ta205 and near 4 X 10-4 for TiO2. Damage tests with a 114 um radius, 5 ns pulse length, 1.06 um wavelength laser show an onset energy flux for visible damage in the 12 to 30 J/cm2 range for single-layer films, and slightly less for a three-layer structure.

Paper Details

Date Published: 1 August 1983
PDF: 3 pages
Opt. Eng. 22(4) 224447 doi: 10.1117/12.7973141
Published in: Optical Engineering Volume 22, Issue 4
Show Author Affiliations
J. R. Sites, Colorado State University (United States)
P. Gilstrap, Colorado State University (United States)
R. Rujkorakarn, Colorado State University (United States)


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