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Optical Engineering

Resist Possibilities In Ion Beam Lithography
Author(s): A. Macrander; D. Barr; A. Wagner
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Paper Details

Date Published: 1 April 1983
PDF: 5 pages
Opt. Eng. 22(2) doi: 10.1117/12.7973085
Published in: Optical Engineering Volume 22, Issue 2
Show Author Affiliations
A. Macrander, Bell Laboratories (United States)
D. Barr, Bell Laboratories (United States)
A. Wagner, Bell Laboratories (United States)

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