Share Email Print
cover

Optical Engineering

Masked Ion Beam Lithography For Submicrometer Device Fabrication
Author(s): C. W. Slayman; J. L. Bartelt; C. M. McKenna; J. Y. Chen
Format Member Price Non-Member Price
PDF $20.00 $25.00

Paper Details

Date Published: 1 April 1983
PDF: 7 pages
Opt. Eng. 22(2) doi: 10.1117/12.7973084
Published in: Optical Engineering Volume 22, Issue 2
Show Author Affiliations
C. W. Slayman, Hughes Research Laboratories (United States)
J. L. Bartelt, Hughes Research Laboratories (United States)
C. M. McKenna, Hughes Research Laboratories (United States)
J. Y. Chen, Hughes Research Laboratories (United States)


© SPIE. Terms of Use
Back to Top