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Optical Engineering

X-Ray Lithography Applied To The Fabrication Of One Micrometer N-Channel Metal Oxide Semiconductor Circuits
Author(s): E. N. Fuls
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Paper Details

Date Published: 1 April 1983
PDF: 4 pages
Opt. Eng. 22(2) doi: 10.1117/12.7973082
Published in: Optical Engineering Volume 22, Issue 2
Show Author Affiliations
E. N. Fuls, Bell Laboratories (United States)

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