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Optical Engineering

State Of Art Of Acrylate Resists: An Overview Of Polymer Structure And Lithographic Performance
Author(s): Wayne M. Moreau
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Paper Abstract

The acrylate family of resists based on polymethyl methacrylate (PMMA) has paved the way for submicron lithography. The physical and chemical modifications, which have improved the performance of PMMA, are reviewed. These improvements include sensitivity to radiation (electron-beam, optical, ion, and x-ray), thermal and plasma process stability, and superior film quality. Structural modifications of the acrylate polymer chain have been the main contributors to enhanced lithographic performance.

Paper Details

Date Published: 1 April 1983
PDF: 4 pages
Opt. Eng. 22(2) 222181 doi: 10.1117/12.7973078
Published in: Optical Engineering Volume 22, Issue 2
Show Author Affiliations
Wayne M. Moreau, International Business Machines Corporation (United States)


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