Share Email Print
cover

Optical Engineering

State Of Art Of Acrylate Resists: An Overview Of Polymer Structure And Lithographic Performance
Author(s): Wayne M. Moreau
Format Member Price Non-Member Price
PDF $20.00 $25.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

The acrylate family of resists based on polymethyl methacrylate (PMMA) has paved the way for submicron lithography. The physical and chemical modifications, which have improved the performance of PMMA, are reviewed. These improvements include sensitivity to radiation (electron-beam, optical, ion, and x-ray), thermal and plasma process stability, and superior film quality. Structural modifications of the acrylate polymer chain have been the main contributors to enhanced lithographic performance.

Paper Details

Date Published: 1 April 1983
PDF: 4 pages
Opt. Eng. 22(2) 222181 doi: 10.1117/12.7973078
Published in: Optical Engineering Volume 22, Issue 2
Show Author Affiliations
Wayne M. Moreau, International Business Machines Corporation (United States)


© SPIE. Terms of Use
Back to Top