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Optical Engineering

Use Of Laser Annealing To Achieve Low Loss In Corning 7059 Glass, ZnO, Si3N4, Nb205, and Ta205 Optical Thin-Film Waveguides
Author(s): S. Dutta; H. E. Jackson; J. T. Boyd
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Paper Abstract

We report considerable success in using the technique of laser annealing to reduce scattering in a variety of thin-film optical waveguides deposited onto thermally oxidized silicon substrates. For the materials Si3N4, Nb2O5, and Ta205, values of waveguide loss less than 1 dB/cm were achieved. Values of waveguide loss as low as 0.01 dB/cm have been measured for laser-annealed ZnO waveguides and for Corning 7059 glass waveguides which have been both laser annealed and had surface coatings applied.

Paper Details

Date Published: 1 February 1983
PDF: 4 pages
Opt. Eng. 22(1) 221117 doi: 10.1117/12.7973058
Published in: Optical Engineering Volume 22, Issue 1
Show Author Affiliations
S. Dutta, University of Cincinnati (United States)
H. E. Jackson, University of Cincinnati (United States)
J. T. Boyd, University of Cincinnati (United States)


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