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Optical Engineering

Detection of thickness uniformity of film layers in semiconductor devices by spatially resolved ellipso-interferometry
Author(s): Teruhito Mishima; Kwan C. Kao
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Paper Details

Date Published: 1 December 1982
PDF: 5 pages
Opt. Eng. 21(6) doi: 10.1117/12.7973036
Published in: Optical Engineering Volume 21, Issue 6
Show Author Affiliations
Teruhito Mishima, University of Manitoba (Canada)
Kwan C. Kao, University of Manitoba (Canada)

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