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Optical Engineering

Developments In Moire Interferometry
Author(s): Daniel Post
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Paper Abstract

Recent progress in high-sensitivity moire interferometry is reviewed. Interference patterns reveal full-field contour maps of in-plane displacements. Sensitivity corresponds to moire with 1200 lines/mm (30,480 //in.) for most examples, but approaches the theoretical limit of X/2 displacement per fringe in one demonstration. Techniques for producing cross-line phase gratings on specimens are described, as well as use of real and virtual reference gratings. Carrier patterns and optical filtering are used to cancel initial or no-load patterns. Diverse applications are illustrated.

Paper Details

Date Published: 1 June 1982
PDF: 10 pages
Opt. Eng. 21(3) 213458 doi: 10.1117/12.7972930
Published in: Optical Engineering Volume 21, Issue 3
Show Author Affiliations
Daniel Post, Virginia Polytechnic Institute and State University (United States)


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