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Optical Engineering

Reduction Of Errors Of Microphotographic Reproductions By Optimal Corrections Of Original Masks
Author(s): Bahaa E.A. Saleh; Soheil I. Sayegh
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Paper Abstract

Using image restoration techniques, we report on an algorithm for determining the optimum correction of original masks, which are to be reduced by a given microphotographic system, in order to compensate for the system's distortion. The film is assumed highly nonlinear. As an example, we compute the profile of serifs that should be added to corners to compensate for distortion in a diffraction-limited imaging system.

Paper Details

Date Published: 1 October 1981
PDF: 4 pages
Opt. Eng. 20(5) 205781 doi: 10.1117/12.7972810
Published in: Optical Engineering Volume 20, Issue 5
Show Author Affiliations
Bahaa E.A. Saleh, University of Wisconsin--Madison (United States)
Soheil I. Sayegh, University of Wisconsin--Madison (United States)


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