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Optical Engineering

Improved Integrating Exposure-Control System For Color Holography
Author(s): B. F. Oreb; P. Hariharan
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Paper Abstract

The exposure-control system described in this paper has been found extremely useful in the production of multicolor holograms, which require precise repetition of exposures at different laser wavelengths. It permits rapid measurements of the irradiances of the object and reference beams in the hologram plane for adjustments of the beam ratio, as well as summation of these irradiances and automatic determination of the exposure time for a desired radiant exposure. A separate detector continuously monitors the laser power and automatically adjusts the exposure time to compensate for varia-tions in laser output during the exposure. A simple interlock ensures the correct combination of settings of detector sensitivity and radiant exposure when changing from one wavelength to another.

Paper Details

Date Published: 1 October 1981
PDF: 4 pages
Opt. Eng. 20(5) doi: 10.1117/12.7972802
Published in: Optical Engineering Volume 20, Issue 5
Show Author Affiliations
B. F. Oreb, CSIRO Division of Applied Physics (Australia)
P. Hariharan, CSIRO Division of Applied Physics (Australia)


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