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Optical Engineering

Optical Properties Of Tellurium Films Used For Data Recording
Author(s): Thomas H. Allen; Gary S. Ash
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Paper Abstract

The complex optical index of refraction for evaporated films of tellurium has been measured using ellipsometry over the wavelength range 439 to 633 nm. Values of n and k as a function of wavelength and as a function of thickness are presented. The transmittance and reflectance of single layers of tellurium, as well as multilayer structures to be used for optical data recording media, are shown as a function of wavelength. Oxide formation of these films has also been measured, and a model for the role of oxides in altering adhesion of the films is presented.

Paper Details

Date Published: 1 June 1981
PDF: 4 pages
Opt. Eng. 20(3) 203373 doi: 10.1117/12.7972725
Published in: Optical Engineering Volume 20, Issue 3
Show Author Affiliations
Thomas H. Allen, Optical Coating Laboratory, Inc. (United States)
Gary S. Ash, CTI-Cryogenics (United States)

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