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Optical Engineering

In Situ Characterization of Positive Resist Development
Author(s): W. G. Oldham
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Paper Details

Date Published: 1 February 1979
PDF: 4 pages
Opt. Eng. 18(1) doi: 10.1117/12.7972320
Published in: Optical Engineering Volume 18, Issue 1
Show Author Affiliations
W. G. Oldham, University of California (United States)

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