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Optical Engineering

Development of a Two-Step E-Beam Lithography Process For Submicron Surface Acoustic Wave (SAW) Device Fabrication
Author(s): D. B. MacDonald; C. F. Shaffer; T. G. Blocker III; R. C. Vail
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Paper Details

Date Published: 1 February 1979
PDF: 6 pages
Opt. Eng. 18(1) doi: 10.1117/12.7972319
Published in: Optical Engineering Volume 18, Issue 1
Show Author Affiliations
D. B. MacDonald, Texas Instruments (United States)
C. F. Shaffer, Texas Instruments (United States)
T. G. Blocker III, Texas Instruments (United States)
R. C. Vail, Texas Instruments (United States)

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